Overview

Solvent Resist Strip is used to remove photo resist from the surface of the wafer. Most resist manufacturers recommend the solvent resist strip chemistry to remove the photo-resist. Some solvent strippers are water soluble while others must be processed through IPA or another solution prior to rinsing with DI water. Most of the solvent-based chemistries used to remove resist are proprietary to their manufacturer as well as the recommended processes. We therefore refer you to the chemical solvent provider for recommendations regarding use of their particular chemistry in your application.

If you have questions regarding your process, or require further information, please contact us.